Ion Beam Sputtering (Conventional) | Coating Capabilities
Ion Beam Sputtering (Conventional) | Coating Capabilities
Ion Beam Sputtering (Conventional) | Coating Capabilities
Ion Beam Sputtering (Conventional) | Coating Capabilities
Ion Beam Sputtering (Conventional) | Coating Capabilities
We offer traditional Ion Beam Sputtered coatings with conventional Ta2O5/SiO2 and HfO2/SiO2 discrete material thin film designs.
Description
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Using this method, we can produce low loss coatings with either very low or very high reflectivity. Very precise anti-reflection coatings have been produced with R < 0.005% (50ppm) for both laser crystals and optical glasses. We can also produce high-reflector coatings with R > 99.99% for selected wavelengths. Ion Beam Sputtering is a precise deposition process and, when combined with our broad-band optical monitoring, allows us to produce accurate Dichroic, Beamsplitter, and Partial-Reflector coatings on a variety of materials. These coatings are very dense and do not have the water absorption/desorption spectral shift generally seen with Electron-Beam evaporated coatings. Our films are stable and environmentally robust.
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Using this method, we can produce low loss coatings with either very low or very high reflectivity. Very precise anti-reflection coatings have been produced with R < 0.005% (50ppm) for both laser crystals and optical glasses. We can also produce high-reflector coatings with R > 99.99% for selected wavelengths. Ion Beam Sputtering is a precise deposition process and, when combined with our broad-band optical monitoring, allows us to produce accurate Dichroic, Beamsplitter, and Partial-Reflector coatings on a variety of materials. These coatings are very dense and do not have the water absorption/desorption spectral shift generally seen with Electron-Beam evaporated coatings. Our films are stable and environmentally robust.